ATLANTA, USA AND TOKYO, JAPAN - OFS and Shin-Etsu Chemical Co., Ltd. announced that OFS has agreed to license OFS’ US Patent No. 6,131,415 and its foreign counterparts to Shin- Etsu.
According to Shin-Etsu, this patent relates to the method of manufacture of preforms with a soot based core rod, such as Vapor Axial Deposition (VAD) and synthetic overclad cylinder glass to provide low water peak fiber performance.
This patented preform process is used to manufacture OFS’s AllWave ZWP fibers which exceed the industry’s most stringent and comprehensive table of specifications for standard single-mode fiber, ITU-T G.652.D.
This agreement between leading fiber-optic companies demonstrates the critical importance of low-water-peak fibers. It further supports the performance and cost competitiveness of the pure synthetic hybrid VAD / Cylinder preform technology employed by OFS.
This licensed technology allows Shin-Etsu to quickly expand the existing capability of the preform production facilities at its Kashima Plant, Ibaraki Prefecture, Japan.
Shin-Etsu is the top global manufacturer of silicon wafers. The company also supplies essential electronics materials needed in every phase of the semiconductor device manufacturing process from prefabrication to post-fabrication.
OFS is a world-leading designer, manufacturer and provider of optical fiber, optical fiber cable, FTTX, optical connectivity and specialty photonics products.